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Researchers work on developing new-generation semiconductor technology at the Korea Institute of Science and Technology in Seoul on July 19. (Yonhap News)

Samsung Electronics successfully introduced domestically produced high-purity hydrogen fluoride (etching gas) to its lines in its semiconductor production process. The introduction signals results from continued government and industry efforts to reduce dependence on Japanese materials.

On Sept. 3, Samsung Electronics announced that “domestically produced hydrogen fluoride was applied in a portion of productions on some semiconductor lines.”

A Samsung Electronics official said, “With continued efforts toward diversification under way, more time will be needed.”

“We will also continue to cooperate with our existing accounts,” the official added.

The development comes two months after Japan moved on July 4 to intensify export controls on major materials used in the semiconductor process, including high-purity hydrogen fluoride and photoresist. In view of the testing process and other factors, industry observers had predicted it would take around three to six months to introduce domestically produced materials. LG Display also succeeded earlier in introducing domestically produced high-purity hydrogen fluoride into its production process.

By Song Gyung-hwa, staff reporter

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